Use este identificador para citar ou linkar para este item: https://repositorio.ufba.br/handle/ri/12687
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dc.contributor.authorSilva, A. Ferreira da-
dc.contributor.authorPersson, C.-
dc.contributor.authorBerggren, K. F.-
dc.contributor.authorPepe, Iuri Muniz-
dc.contributor.authorAlves, A. Santos-
dc.contributor.authorOliveira, A. G. de-
dc.creatorSilva, A. Ferreira da-
dc.creatorPersson, C.-
dc.creatorBerggren, K. F.-
dc.creatorPepe, Iuri Muniz-
dc.creatorAlves, A. Santos-
dc.creatorOliveira, A. G. de-
dc.date.accessioned2013-08-22T17:31:28Z-
dc.date.available2013-08-22T17:31:28Z-
dc.date.issued1998-
dc.identifier.issn0167-9317-
dc.identifier.urihttp://www.repositorio.ufba.br/ri/handle/ri/12687-
dc.descriptionTexto completo. Acesso restrito. p. 423–429pt_BR
dc.description.abstractWe have investigated the band gap shift of Si-doped AlxGa1−xAs alloys as a function of both silicon concentration and Al composition. Correlation and impurity scattering effects were included in the theoretical model. The optical absorption of Al0.3Ga0.7As:Si at the fundamental band gap energy has been measured by a photoacoustic spectroscopy technique. We found the energy gap at about 1.8 eV. The samples were grown by molecular beam epitaxy and the Al fraction was measured by reflection high energy electro-diffraction technique.pt_BR
dc.language.isoenpt_BR
dc.publisherMicroelectronic Engineeringpt_BR
dc.sourcehttp://dx.doi.org.ez10.periodicos.capes.gov.br/10.1016/S0167-9317(98)00201-9pt_BR
dc.subjectDoped AlGaAs alloyspt_BR
dc.subjectBand gap energypt_BR
dc.subjectPhotoacoustic spectroscopypt_BR
dc.subjectMolecular beam epitaxypt_BR
dc.titleOptical absorption and band gap shift of n-doped AlxGa1−xAs alloys grown by MBEpt_BR
dc.title.alternativeMicroelectronic Engineeringpt_BR
dc.typeArtigo de Periódicopt_BR
dc.description.localpubSalvadorpt_BR
dc.identifier.numberv. 43–44pt_BR
Aparece nas coleções:Artigo Publicado em Periódico (FIS)

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