Por favor, use este identificador para citar o enlazar este ítem:
https://repositorio.ufba.br/handle/ri/7519
metadata.dc.type: | Artigo de Periódico |
Título : | Sponge-like and columnar porous silicon implanted with nitrogen by plasma immersion ion implantation (PIII) |
Otros títulos : | Surface and Coatings Technology |
Autor : | Beloto, Antonio Fernando Ueda, Mario Abramof, Eduardo Senna, Jose Roberto Sbragia Silva, Marcos Dias da Kuranaga, Carlos Reuther, H. Silva, Antonio Ferreira da Pepe, Iuri Muniz |
metadata.dc.creator: | Beloto, Antonio Fernando Ueda, Mario Abramof, Eduardo Senna, Jose Roberto Sbragia Silva, Marcos Dias da Kuranaga, Carlos Reuther, H. Silva, Antonio Ferreira da Pepe, Iuri Muniz |
Resumen : | Sponge-like and columnar porous silicon (PS) were prepared from p- and n-type (100) monocrystalline silicon wafers using different anodization conditions (hydrofluoric acid concentration, current density and anodization time) and then implanted with nitrogen by plasma immersion ion implantation (PIII). The effect of the implantation and of the compounds formed was analyzed by measuring the reflectance of the implanted samples for wavelengths between 220 and 800 nm. A reduction in reflectance in the ultraviolet (UV) region of the spectrum was observed for polished Si samples and for all kinds of PS samples. Increased UV-induced photoluminescence in these samples caused by the increase in absorption in the UV region is expected. |
Palabras clave : | Porous silicon Plasma immersion ion implantation (PIII) Reflectance |
URI : | http://www.repositorio.ufba.br/ri/handle/ri/7519 |
Fecha de publicación : | 2002 |
Aparece en las colecciones: | Artigo Publicado em Periódico (FIS) |
Ficheros en este ítem:
Fichero | Descripción | Tamaño | Formato | |
---|---|---|---|---|
1-s2.0-S0257897202001068-main.pdf Restricted Access | 410,36 kB | Adobe PDF | Visualizar/Abrir Request a copy |
Los ítems de DSpace están protegidos por copyright, con todos los derechos reservados, a menos que se indique lo contrario.