Please use this identifier to cite or link to this item: https://repositorio.ufba.br/handle/ri/8705
metadata.dc.type: Artigo de Periódico
Title: The refractive index enhancement at Si/Si O2 interfaces
Other Titles: Superlattices and Microstructures
Authors: Costa, E. A. Guimarães
Mota, F. de Brito
Silva, A. Ferreira da
metadata.dc.creator: Costa, E. A. Guimarães
Mota, F. de Brito
Silva, A. Ferreira da
Abstract: A polarization catastrophe is predicted for the refractive index of an inversion layer in a Si/Si O2 Metal - Oxide - Semiconductor Field-Effect Transition (MOSFET). The results detect a metal non-metal transition at a certain impurity critical concentration.
URI: http://www.repositorio.ufba.br/ri/handle/ri/8705
Issue Date: 1993
Appears in Collections:Artigo Publicado em Periódico (FIS)

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